Composition of Ge(Si) Islands in the Growth of Ge on Si(111)
Ratto, Fulvio, Rosei, Federico, Locatelli, Andrea, Cherifi, Salia, Fontana, Stefano, Heun, Stefan, Szkutnik, Pierre-David , Sgarlata, Anna , De Crescenzi, Maurizio , & Motta, Nunzio (2004) Composition of Ge(Si) Islands in the Growth of Ge on Si(111). Applied Physics Letters, 84(22), pp. 4526-4528.
X-ray photoemission electron microscopy (XPEEM) is used to investigate the chemical composition of Ge/Si individual islands obtained by depositing Ge on Si(111) substrates in the temperature range 460–560 degrees C. We are able to correlate specific island shapes with a definite chemical contrast in XPEEM images, at each given temperature. In particular, strained triangular islands exhibit a Si surface content of 5%–20%, whereas it grows up to 30%–40% for "atoll-like" structures. The island's stage of evolution is shown to be correlated with its surface composition. Finally, by plotting intensity contour maps, we find that island centers are rich in Si.
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|Item Type:||Journal Article|
|Divisions:||Past > QUT Faculties & Divisions > Faculty of Built Environment and Engineering|
|Copyright Owner:||Copyright 2004 American Institute of Physics|
|Copyright Statement:||Reproduced in accordance with the copyright policy of the publisher.|
|Deposited On:||14 Nov 2007|
|Last Modified:||29 Feb 2012 23:30|
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