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XPS and 19F NMR Study of the Photodegradation at 157 nm of Photolithographic-Grade Teflon AF Thin Films

Blakey, Idriss, George, Graeme, Hill, David, Liu, Heping, Rasoul, Firas, Whittaker, Andrew, & Zimmerman, Paul (2005) XPS and 19F NMR Study of the Photodegradation at 157 nm of Photolithographic-Grade Teflon AF Thin Films. Macromolecules, 38, pp. 4050-4053.

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7 citations in Scopus
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ID Code: 23232
Item Type: Journal Article
Additional Information: This article is freely available from the American Chemical Society website 12 months after the publication date. See links to publisher website in this record.
ISSN: 0024-9297
Subjects: Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300)
Divisions: Past > QUT Faculties & Divisions > Faculty of Science and Technology
Deposited On: 17 Jun 2009 23:46
Last Modified: 29 Feb 2012 23:17

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