XPS and 19F NMR Study of the Photodegradation at 157 nm of Photolithographic-Grade Teflon AF Thin Films
Blakey, Idriss, George, Graeme, Hill, David , Liu, Heping, Rasoul, Firas , Whittaker, Andrew , & Zimmerman, Paul (2005) XPS and 19F NMR Study of the Photodegradation at 157 nm of Photolithographic-Grade Teflon AF Thin Films. Macromolecules, 38, pp. 4050-4053.
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|Item Type:||Journal Article|
|Additional Information:||This article is freely available from the American Chemical Society website 12 months after the publication date. See links to publisher website in this record.|
|Subjects:||Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300)|
|Divisions:||Past > QUT Faculties & Divisions > Faculty of Science and Technology|
|Deposited On:||17 Jun 2009 23:46|
|Last Modified:||29 Feb 2012 23:17|
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