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Application of quantitative structure property relationship to the design of high refractive index 193i resist

Blakey, Idriss, Conley, Willard, George, Graeme, Hill, David, Liu, Heping, & Whittaker, Andrew (2008) Application of quantitative structure property relationship to the design of high refractive index 193i resist. Journal of Micro/Nanolithography, MEMS, and MOEMS, 7(2), 023001-1-023001-11.

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6 citations in Web of Science®
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ID Code: 30900
Item Type: Journal Article
Keywords: quantitative structure property relationship (QSPR), photolithography, photoresist
DOI: 10.1117/1.2908937
ISSN: 1932-5150
Subjects: Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300) > Optical Properties of Materials (030303)
Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300) > Physical Chemistry of Materials (030304)
Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300) > Theory and Design of Materials (030307)
Divisions: Past > QUT Faculties & Divisions > Faculty of Science and Technology
Deposited On: 12 Feb 2010 22:50
Last Modified: 29 Feb 2012 23:53

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