Application of quantitative structure property relationship to the design of high refractive index 193i resist
Blakey, Idriss, Conley, Willard, George, Graeme, Hill, David, Liu, Heping, & Whittaker, Andrew (2008) Application of quantitative structure property relationship to the design of high refractive index 193i resist. Journal of Micro/Nanolithography, MEMS, and MOEMS, 7(2), 023001-1-023001-11.
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| ID Code: | 30900 |
|---|---|
| Item Type: | Journal Article |
| Keywords: | quantitative structure property relationship (QSPR), photolithography, photoresist |
| DOI: | 10.1117/1.2908937 |
| ISSN: | 1932-5150 |
| Subjects: | Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300) > Optical Properties of Materials (030303) Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300) > Physical Chemistry of Materials (030304) Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300) > Theory and Design of Materials (030307) |
| Divisions: | Past > QUT Faculties & Divisions > Faculty of Science and Technology |
| Deposited On: | 12 Feb 2010 22:50 |
| Last Modified: | 29 Feb 2012 23:53 |
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