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Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s : towards applications as EUV photoresists

Lawrie, Kirsten, Blakey, Idriss, Blinco, James, Gronheid, Roel, Jack, Kevin, Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R., & Whittaker, Andrew K. (2011) Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s : towards applications as EUV photoresists. Radiation Physics and Chemistry, 80(2), pp. 236-241.

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Abstract

Poly(olefin sulfone)s, formed by the reaction of sulfur dioxide (SO2) and an olefin, are known to be highly susceptible to degradation by radiation and thus have been identified as candidate materials for chain scission-based extreme ultraviolet lithography (EUVL) resist materials. In order to investigate this further, the synthesis and characterisation of two poly(olefin sulfone)s namely poly(1-pentene sulfone) (PPS) and poly(2-methyl-1-pentene sulfone) (PMPS), was achieved and the two materials were evaluated for possible chain scission EUVL resist applications. It was found that both materials possess high sensitivities to EUV photons; however; the rates of outgassing were extremely high. The only observed degradation products were found to be SO2 and the respective olefin suggesting that depolymerisation takes place under irradiation in a vacuum environment. In addition to depolymerisation, a concurrent conversion of SO2 moieties to a sulfide phase was observed using XPS.

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8 citations in Web of Science®

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ID Code: 45919
Item Type: Journal Article
Keywords: Poly(olefin sulfone); EUV; Photoresist
DOI: 10.1016/j.radphyschem.2010.07.038
ISSN: 0969-806X
Subjects: Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300)
Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300) > Synthesis of Materials (030306)
Divisions: Past > Schools > Chemistry
Past > QUT Faculties & Divisions > Faculty of Science and Technology
Deposited On: 13 Sep 2011 08:35
Last Modified: 27 Jun 2014 11:39

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