Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s : towards applications as EUV photoresists
Lawrie, Kirsten , Blakey, Idriss , Blinco, James, Gronheid, Roel , Jack, Kevin , Pollentier, Ivan , Leeson, Michael J. , Younkin, Todd R. , & Whittaker, Andrew K. (2011) Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s : towards applications as EUV photoresists. Radiation Physics and Chemistry, 80(2), pp. 236-241.
Poly(olefin sulfone)s, formed by the reaction of sulfur dioxide (SO2) and an olefin, are known to be highly susceptible to degradation by radiation and thus have been identified as candidate materials for chain scission-based extreme ultraviolet lithography (EUVL) resist materials. In order to investigate this further, the synthesis and characterisation of two poly(olefin sulfone)s namely poly(1-pentene sulfone) (PPS) and poly(2-methyl-1-pentene sulfone) (PMPS), was achieved and the two materials were evaluated for possible chain scission EUVL resist applications. It was found that both materials possess high sensitivities to EUV photons; however; the rates of outgassing were extremely high. The only observed degradation products were found to be SO2 and the respective olefin suggesting that depolymerisation takes place under irradiation in a vacuum environment. In addition to depolymerisation, a concurrent conversion of SO2 moieties to a sulfide phase was observed using XPS.
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|Item Type:||Journal Article|
|Keywords:||Poly(olefin sulfone); EUV; Photoresist|
|Subjects:||Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300)|
Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300) > Synthesis of Materials (030306)
|Divisions:||Past > Schools > Chemistry|
Past > QUT Faculties & Divisions > Faculty of Science and Technology
|Deposited On:||13 Sep 2011 08:35|
|Last Modified:||13 Sep 2011 08:35|
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