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Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Lawrie, Kirsten J., Blakey, Idriss, Blinco, James P., Cheng, Han Hao, Gronheid, Roel, Jack, Kevin S., Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R., & Whittaker, Andrew K. (2011) Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers. Journal of Materials Chemistry, 21(15), pp. 5629-5637.

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Abstract

A series of polymers with a comb architecture were prepared where the poly(olefin sulfone) backbone was designed to be highly sensitive to extreme ultraviolet (EUV) radiation, while the well-defined poly(methyl methacrylate) (PMMA) arms were incorporated with the aim of increasing structural stability. It is hypothesized that upon EUV radiation rapid degradation of the polysulfone backbone will occur leaving behind the well-defined PMMA arms. The synthesized polymers were characterised and have had their performance as chain-scission EUV photoresists evaluated. It was found that all materials possess high sensitivity towards degradation by EUV radiation (E0 in the range 4–6 mJ cm−2). Selective degradation of the poly(1-pentene sulfone) backbone relative to the PMMA arms was demonstrated by mass spectrometry headspace analysis during EUV irradiation and by grazing-angle ATR-FTIR. EUV interference patterning has shown that materials are capable of resolving 30 nm 1:1 line:space features. The incorporation of PMMA was found to increase the structural integrity of the patterned features. Thus, it has been shown that terpolymer materials possessing a highly sensitive poly(olefin sulfone) backbone and PMMA arms are able to provide a tuneable materials platform for chain scission EUV resists. These materials have the potential to benefit applications that require nanopattering, such as computer chip manufacture and nano-MEMS.

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13 citations in Scopus
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9 citations in Web of Science®

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ID Code: 45924
Item Type: Journal Article
Keywords: Polymer synthesis, Synthesis of poly(1-pentene sulfone), EUV
DOI: 10.1039/c0jm03288c
ISSN: 0959-9428
Subjects: Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300)
Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300) > Chemical Characterisation of Materials (030301)
Divisions: Past > Schools > Chemistry
Past > QUT Faculties & Divisions > Faculty of Science and Technology
Deposited On: 13 Sep 2011 08:51
Last Modified: 27 Jun 2014 11:16

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