Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography
Yu, Anguang, Liu, Heping, Blinco, James P., Jack, Kevin S., Leeson, Michael, Younkin, Todd R., Whittaker, Andrew K., & Blakey, Idriss (2010) Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography. Macromolecular Rapid Communications, 31(16), pp. 1449-1455.
A series of high-performance polycarbonates have been prepared with glass-transition temperatures and decomposition temperatures that are tunable by varying the repeat-unit chemical structure. Patterning of the polymers with extreme UV lithography has been achieved by taking advantage of direct photoinduced chain scission of the polymer chains, which results in a molecular-weight based solubility switch. After selective development of the irradiated regions of the polymers, feature sizes as small as 28.6 nm have been printed and the importance of resist-developer interactions for maximizing image quality has been demonstrated.
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|Item Type:||Journal Article|
|Keywords:||functional materials;lithography;mechanical properties;polycarbonates;synthesis|
|Subjects:||Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300)|
|Divisions:||Past > Schools > Chemistry|
Past > QUT Faculties & Divisions > Faculty of Science and Technology
|Deposited On:||13 Sep 2011 09:10|
|Last Modified:||13 Sep 2011 09:10|
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