Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography

Yu, Anguang, Liu, Heping, Blinco, James P., Jack, Kevin S., Leeson, Michael, Younkin, Todd R., Whittaker, Andrew K., & Blakey, Idriss (2010) Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography. Macromolecular Rapid Communications, 31(16), pp. 1449-1455.

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A series of high-performance polycarbonates have been prepared with glass-transition temperatures and decomposition temperatures that are tunable by varying the repeat-unit chemical structure. Patterning of the polymers with extreme UV lithography has been achieved by taking advantage of direct photoinduced chain scission of the polymer chains, which results in a molecular-weight based solubility switch. After selective development of the irradiated regions of the polymers, feature sizes as small as 28.6 nm have been printed and the importance of resist-developer interactions for maximizing image quality has been demonstrated.

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19 citations in Web of Science®

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ID Code: 45928
Item Type: Journal Article
Refereed: Yes
Keywords: functional materials;lithography;mechanical properties;polycarbonates;synthesis
DOI: 10.1002/marc.201000117
ISSN: 1022-1336
Subjects: Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300)
Divisions: Past > Schools > Chemistry
Past > QUT Faculties & Divisions > Faculty of Science and Technology
Deposited On: 12 Sep 2011 23:10
Last Modified: 27 Jun 2014 02:21

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