Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography

Blakey, Idriss, Yu, Anguang, Blinco, James P., Jack, Kevin S., Liu, Heping, Leeson, Michael, Yueh, Wang, Younkin, Todd, & Whittaker, Andrew K. (2010) Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography. In The International Society for Optical Engineering Conference On Extreme Ultraviolet (EUV) Lithography, 21 - 25 February 2010, San Jose Convention Center, San Jose, CA.

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Some initial EUVL patterning results for polycarbonate based non-chemically amplified resists are presented. Without full optimization the developer a resolution of 60 nm line spaces could be obtained. With slight overexposure (1.4 × E0) 43.5 nm lines at a half pitch of 50 nm could be printed. At 2x E0 a 28.6 nm lines at a half pitch of 50 nm could be obtained with a LER that was just above expected for mask roughness. Upon being irradiated with EUV photons, these polymers undergo chain scission with the loss of carbon dioxide and carbon monoxide. The remaining photoproducts appear to be non-volatile under standard EUV irradiation conditions, but do exhibit increased solubility in developer compared to the unirradiated polymer. The sensitivity of the polymers to EUV light is related to their oxygen content and ways to increase the sensitivity of the polymers to 10 mJ cm-2 is discussed.

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4 citations in Web of Science®
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ID Code: 45929
Item Type: Conference Item (Presentation)
Refereed: Yes
Keywords: EUVL , polycarbonate , EUV irradiation
DOI: 10.1117/12.853620
ISBN: 9780819480507
ISSN: 0277-786X
Subjects: Australian and New Zealand Standard Research Classification > CHEMICAL SCIENCE (030000) > MACROMOLECULAR AND MATERIALS CHEMISTRY (030300)
Divisions: Past > Schools > Chemistry
Past > QUT Faculties & Divisions > Faculty of Science and Technology
Deposited On: 12 Sep 2011 23:27
Last Modified: 06 May 2014 02:21

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