Development of polymers for Non-CAR resists for EUV lithography

Whittaker, Andrew K., Blakey, Idriss, Blinco, James P., Jack, Kevin S., Lawrie, Kirsten J., Liu, Heping, Yu, Anguang, Leeson, Michael J., Yeuh, Wang, & Younkin, Todd R. (2009) Development of polymers for Non-CAR resists for EUV lithography. In Henderson, C.L. (Ed.) Advances in Resist Materials and Processing Technology XXVI. SPIE-INT SOC OPTICAL ENGINEERING.

View at publisher (open access)


Three strategies for approaching the design and synthesis of non-chemically amplified resists (non-CARs) are presented. These are linear polycarbonates, star polyester-blk-poly(methyl methacrylate) and comb polymers with polysulfone backbones. The linear polycarbonates were designed to cleave when irradiated with 92 eV photons and high Tg alicyclic groups were incorporated into the backbone to increase Tg and etch resistance. The star block copolymers were designed to have a core that is sensitive to 92 eV photons and arms that have the potential to provide properties such as high Tg and etch resistance. Similarly the polysulfone comb polymers were designed to have an easily degradable polymer backbone and comb-arms that impart favorable physical properties. Initial patterning results are presented for a number of the systems.

Impact and interest:

11 citations in Scopus
Search Google Scholar™
9 citations in Web of Science®

Citation counts are sourced monthly from Scopus and Web of Science® citation databases.

These databases contain citations from different subsets of available publications and different time periods and thus the citation count from each is usually different. Some works are not in either database and no count is displayed. Scopus includes citations from articles published in 1996 onwards, and Web of Science® generally from 1980 onwards.

Citations counts from the Google Scholar™ indexing service can be viewed at the linked Google Scholar™ search.

ID Code: 70008
Item Type: Book Chapter
DOI: 10.1117/12.820493
Divisions: Current > Schools > School of Chemistry, Physics & Mechanical Engineering
Past > QUT Faculties & Divisions > Faculty of Science and Technology
Copyright Owner: Copyright 2009 SPIE-INT SOC OPTICAL ENGINEERING
Deposited On: 10 Apr 2014 00:06
Last Modified: 26 Oct 2015 16:01

Export: EndNote | Dublin Core | BibTeX

Repository Staff Only: item control page