Development of polymers for Non-CAR resists for EUV lithography
Whittaker, Andrew K., Blakey, Idriss, Blinco, James P., Jack, Kevin S., Lawrie, Kirsten J., Liu, Heping, Yu, Anguang, Leeson, Michael J., Yeuh, Wang, & Younkin, Todd R. (2009) Development of polymers for Non-CAR resists for EUV lithography. In Henderson, C.L. (Ed.) Advances in Resist Materials and Processing Technology XXVI. SPIE-INT SOC OPTICAL ENGINEERING.
Three strategies for approaching the design and synthesis of non-chemically amplified resists (non-CARs) are presented. These are linear polycarbonates, star polyester-blk-poly(methyl methacrylate) and comb polymers with polysulfone backbones. The linear polycarbonates were designed to cleave when irradiated with 92 eV photons and high Tg alicyclic groups were incorporated into the backbone to increase Tg and etch resistance. The star block copolymers were designed to have a core that is sensitive to 92 eV photons and arms that have the potential to provide properties such as high Tg and etch resistance. Similarly the polysulfone comb polymers were designed to have an easily degradable polymer backbone and comb-arms that impart favorable physical properties. Initial patterning results are presented for a number of the systems.
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|Item Type:||Book Chapter|
|Divisions:||Current > Schools > School of Chemistry, Physics & Mechanical Engineering
Past > QUT Faculties & Divisions > Faculty of Science and Technology
|Copyright Owner:||Copyright 2009 SPIE-INT SOC OPTICAL ENGINEERING|
|Deposited On:||10 Apr 2014 00:06|
|Last Modified:||26 Oct 2015 16:01|
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