Current control in the magnetron systems for nanofabrication : a comparison
Yick, S., Levchenko, I., Kumar, S., Han, Z. J., Yajadda, M. M. A., & Ostrikov, K. (2012) Current control in the magnetron systems for nanofabrication : a comparison. IEEE Transactions on Plasma Science, 40(4), pp. 1094-1097.
A cylindrical magnetron system and a hybrid inductively coupled plasma-assisted magnetron deposition system were examined experimentally in light of their discharge characteristics with a view to stress the enhanced controllability of the hybrid system. The comparative study has shown that the hybrid magnetron + the inductively coupled plasma system is a flexible, powerful, and convenient tool that has certain advantages as compared with the cylindrical dc magnetrons. In particular, the hybrid system features more linear current-voltage characteristics and the possibility of a bias-independent control of the discharge current.
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|Item Type:||Journal Article|
|Keywords:||Cylindrical dc magnetron, deposition, low-frequency inductively coupled (ICP) plasma, magnetron|
|Divisions:||Current > Schools > School of Chemistry, Physics & Mechanical Engineering
Current > QUT Faculties and Divisions > Science & Engineering Faculty
|Deposited On:||10 Jul 2014 02:53|
|Last Modified:||11 Jul 2014 04:15|
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