Heating and plasma sheath effects in low-temperature, plasma-assisted growth of carbon nanofibers
Mehdipour, Hamid, Ostrikov, Kostya, Rider, Amanda E., & Han, Zhaojun (2011) Heating and plasma sheath effects in low-temperature, plasma-assisted growth of carbon nanofibers. Plasma Processes and Polymers, 8(5), pp. 386-400.
Plasma sheath, nanostructure growth, and thermal models are used to describe carbon nanofiber (CNF) growth and heating in a low-temperature plasma. It is found that when the H2 partial pressure is increased, H atom recombination and H ion neutralization are the main mechanisms responsible for energy release on the catalyst surface. Numerical results also show that process parameters such as the substrate potential, electron temperature and number density mainly affect the CNF growth rate and plasma heating at low catalyst temperatures. In contrast, gas pressure, ion temperature, and the C2H2:H2 supply ratio affect the CNF growth at all temperatures. It is shown that plasma-related processes substantially increase the catalyst particle temperature, in comparison to the substrate and the substrate-holding platform temperatures.
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|Item Type:||Journal Article|
|Keywords:||carbon nanofibres;modeling;nanostructured materials;nanotechnology;plasma-enhanced chemical vapor deposition (PECVD)|
|Divisions:||Current > QUT Faculties and Divisions > Science & Engineering Faculty|
|Deposited On:||10 Jul 2014 03:35|
|Last Modified:||11 Jul 2014 01:42|
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