Single-step, catalyst-free plasma-assisted synthesis and growth mechanism of single-crystalline aluminum nitride nanorods

Huang, S. Y., Cheng, Q. J., Xu, S., & Ostrikov, K. (2010) Single-step, catalyst-free plasma-assisted synthesis and growth mechanism of single-crystalline aluminum nitride nanorods. Applied Physics Letters, 97(21), pp. 213103-1.

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Abstract

Synthesis of one-dimensional AlN nanostructures commonly requires high process temperatures (>900 °C), metal catalyst, and hazardous gas/powder precursors. We report on a simple, single-step, catalyst-free, plasma-assisted growth of dense patterns of size-uniform single-crystalline AlN nanorods at a low substrate temperature (∼650 °C) without any catalyst or hazardous precursors. This unusual growth mechanism is based on highly effective plasma dissociation of N2 molecules, localized species precipitation on AlN islands, and reduced diffusion on the nitrogen-rich surface. This approach can also be used to produce other high-aspect-ratio oxide and nitride nanostructures for applications in energy conversion, sensing, and optoelectronics. © 2010 American Institute of Physics.

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4 citations in Web of Science®

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ID Code: 73762
Item Type: Journal Article
Refereed: Yes
Additional URLs:
DOI: 10.1063/1.3517507
ISSN: 0003-6951
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: Copyright 2010 American Institute of Physics
Deposited On: 10 Jul 2014 23:41
Last Modified: 22 Aug 2014 00:50

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