Uniformity of postprocessing of dense nanotube arrays by neutral and ion fluxes

Levchenko, I., Ostrikov, K., & Tam, E. (2006) Uniformity of postprocessing of dense nanotube arrays by neutral and ion fluxes. Applied Physics Letters, 89(22), pp. 223108-1.

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Abstract

The advantages of using low-temperature plasma environments for postprocessing of dense nanotube arrays are shown by means of multiscale hybrid numerical simulations. By controlling plasma-extracted ion fluxes and varying the plasma and sheath parameters, one can selectively coat, dope, or functionalize different areas on nanotube surfaces. Conditions of uniform deposition of ion fluxes over the entire nanotube surfaces are obtained for different array densities. The plasma route enables a uniform processing of lateral nanotube surfaces in very dense (with a step-to-height ratio of 1:4) arrays, impossible via the neutral gas process wherein radical penetration into the internanotube gaps is poor. © 2006 American Institute of Physics.

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76 citations in Web of Science®

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ID Code: 73771
Item Type: Journal Article
Refereed: Yes
Keywords: Carbon nanotubes, Plasma sheaths, Plasma materials processing
DOI: 10.1063/1.2388941
ISSN: 0003-6951
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: 2006 American Institute of Physics
Deposited On: 11 Jul 2014 00:40
Last Modified: 22 Aug 2014 01:15

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