Uniformity of postprocessing of dense nanotube arrays by neutral and ion fluxes
Levchenko, I., Ostrikov, K., & Tam, E. (2006) Uniformity of postprocessing of dense nanotube arrays by neutral and ion fluxes. Applied Physics Letters, 89(22), pp. 223108-1.
The advantages of using low-temperature plasma environments for postprocessing of dense nanotube arrays are shown by means of multiscale hybrid numerical simulations. By controlling plasma-extracted ion fluxes and varying the plasma and sheath parameters, one can selectively coat, dope, or functionalize different areas on nanotube surfaces. Conditions of uniform deposition of ion fluxes over the entire nanotube surfaces are obtained for different array densities. The plasma route enables a uniform processing of lateral nanotube surfaces in very dense (with a step-to-height ratio of 1:4) arrays, impossible via the neutral gas process wherein radical penetration into the internanotube gaps is poor. © 2006 American Institute of Physics.
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|Item Type:||Journal Article|
|Keywords:||Carbon nanotubes, Plasma sheaths, Plasma materials processing|
|Divisions:||Current > QUT Faculties and Divisions > Science & Engineering Faculty|
|Copyright Owner:||2006 American Institute of Physics|
|Deposited On:||11 Jul 2014 00:40|
|Last Modified:||22 Aug 2014 01:15|
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