How thick SiO2 cap layer is needed to achieve strong visible photoluminescence from SiO2-buffered SiNx films?

Xu, M., Chen, Q.Y., Xu, S., Ostrikov, K., Wei, Y., & Ee, Y.C. (2010) How thick SiO2 cap layer is needed to achieve strong visible photoluminescence from SiO2-buffered SiNx films? Physica E : Low-Dimensional Systems and Nanostructures, 42(8), pp. 2016-2020.

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Abstract

The effect of a SiO2 nanolayer and annealing temperature on the UV/visible room-temperature photoluminescence (PL) from SiNx films synthesized by rf magnetron sputtering is studied. The PL intensity can be maximized when the SiO2 layer is 510 nm thick at 800 °C annealing temperature and only 2 nm at 1000 °C. A compositionstructureproperty analysis reveals that the PL intensity is directly related to both the surface chemical states and the content of the SiO and SiN bonds in the SiNx films. These results are relevant for the development of advanced optoelectronic and photonic emitters and sensors. © 2010 Elsevier B.V. All rights reserved.

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ID Code: 73799
Item Type: Journal Article
Refereed: Yes
Additional URLs:
Keywords: Annealing, Photoluminescence, SiNx film, SiO2
DOI: 10.1016/j.physe.2010.03.006
ISSN: 1386-9477
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Deposited On: 11 Jul 2014 01:09
Last Modified: 13 Jul 2014 23:20

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