The path to stoichiometric composition of III–V binary quantum dots through plasma/ion-assisted self-assembly
Rider, A.E. & Ostrikov, K. (2009) The path to stoichiometric composition of III–V binary quantum dots through plasma/ion-assisted self-assembly. Surface Science, 603(2), pp. 359-368.
Semiconductor III-V quantum dots (QDs) are particularly enticing components for the integration of optically promising III-V materials with the silicon technology prevalent in the microelectronics industry. However, defects due to deviations from a stoichiometric composition [group III: group V = 1] may lead to impaired device performance. This paper investigates the initial stages of formation of InSb and GaAs QDs on Si(1 0 0) through hybrid numerical simulations. Three situations are considered: a neutral gas environment (NG), and two ionized gas environments, namely a localized ion source (LIS) and a background plasma (BP) case. It is shown that when the growth is conducted in an ionized gas environment, a stoichiometric composition may be obtained earlier in the QD as compared to a NG. Moreover, the stoichiometrization time, tst, is shorter for the BP case compared to the LIS scenario. A discussion of the effect of ion/plasma-based tools as well as a range of process conditions on the final island size distribution is also included. Our results suggest a way to obtain a deterministic level of control over nanostructure properties (in particular, elemental composition and size) during the initial stages of growth which is a crucial step towards achieving highly tailored QDs suitable for implementation in advanced technological devices.
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|Item Type:||Journal Article|
|Keywords:||Computer simulation, III-V Semiconductors, Plasma, Quantum dots, Self-assembly, Stoichiometry, Surface diffusion|
|Divisions:||Current > QUT Faculties and Divisions > Science & Engineering Faculty|
|Deposited On:||14 Jul 2014 01:32|
|Last Modified:||15 Jul 2014 00:17|
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