Inductively coupled Ar/CH₄/H₂plasmas for low-temperature deposition of ordered carbon nanostructures

Denysenko, I. B., Xu, S., Long, J. D., Rutkevych, P. P., Azarenkov, N. A., & Ostrikov, K. (2004) Inductively coupled Ar/CH₄/H₂plasmas for low-temperature deposition of ordered carbon nanostructures. Journal of Applied Physics, 95(5), pp. 2713-2724.

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The study of inductively coupled Ar/CH 4/H 2 plasmas in the plasma enhanced chemical vapor deposition (PECVD) of self-assembled carbon nanostructures (CN) was presented. A spatially averaged (global) discharge model was developed to study the densities and fluxes of the radical neutrals and charged species, the effective electron temperature, and methane conversion factors under various conditions. It was found that the deposited cation fluxes in the PECVD of CNs generally exceed those of the radical neutrals. The agreement with the optical emission spectroscopy (OES) and quadrupole mass spectrometry (QMS) was also derived through numerical results.

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ID Code: 73871
Item Type: Journal Article
Refereed: Yes
Additional URLs:
Keywords: emission spectroscopy, inductively coupled plasma, plasma chemical vapor desposition, darbon, nanostructures
DOI: 10.1063/1.1642762
ISSN: 1089-7550
Divisions: Current > Schools > School of Chemistry, Physics & Mechanical Engineering
Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: Copyright 2004 American Institute of Physics
Deposited On: 14 Jul 2014 22:55
Last Modified: 16 Jul 2014 02:40

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