Surface fluxes of Si and C adatoms at initial growth stages of SiC quantum dots

Rider, A.E., Levchenko, I., & Ostrikov, K. (2007) Surface fluxes of Si and C adatoms at initial growth stages of SiC quantum dots. Journal of Applied Physics, 101(4), 044306-1.

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Self-assembly of highly stoichiometric SiC quantum dots still remains a major challenge for the gas/plasma-based nanodot synthesis. By means of a multiscale hybrid numerical simulation of the initial stage (0.1-2.5 s into the process) of deposition of SiCSi (100) quantum dot nuclei, it is shown that equal Si and kst atom deposition fluxes result in strong nonstoichiometric nanodot composition due to very different surface fluxes of Si and C adatoms to the quantum dots. At this stage, the surface fluxes of Si and C adatoms to SiC nanodots can be effectively controlled by manipulating the SiC atom influx ratio and the Si (100) surface temperature. It is demonstrated that at a surface temperature of 800 K the surface fluxes can be equalized after only 0.05 s into the process; however, it takes more then 1 s at a surface temperature of 600 K. Based on the results of this study, effective strategies to maintain a stoichiometric ([Si] [C] =1:1) elemental ratio during the initial stages of deposition of SiCSi (100) quantum dot nuclei in a neutral/ionized gas-based process are proposed.

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ID Code: 73884
Item Type: Journal Article
Refereed: Yes
Additional URLs:
DOI: 10.1063/1.2433752
ISSN: 0021-8979
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: Copyright 2007 American Institute of Physics
Deposited On: 14 Jul 2014 02:44
Last Modified: 15 Jul 2014 01:42

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