Thermophoretic control of building units in the plasma-assisted deposition of nanostructured carbon films
Rutkevych, P.P., Ostrikov, K., Xu, S., & Vladimirov, S.V. (2004) Thermophoretic control of building units in the plasma-assisted deposition of nanostructured carbon films. Journal of Applied Physics, 96(8), pp. 4421-4428.
The role of the plasma-grown nanoparticles in the plasma-enhanced chemical vapor deposition (PECVD) of the nanostructured carbon-based films was investigated. The samples were grown in the low-pressure rf plasmas of CH 4+H2+Ar gas mixtures. The enhanced deposition of the building units from the gas phase was found to support the formation of polymorphous nanostructured carbon films. The results reveal the crucial role played by the thermophoretic force in controlling the deposition of the plasma-grown fine particles.
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|Item Type:||Journal Article|
|Divisions:||Current > QUT Faculties and Divisions > Science & Engineering Faculty|
|Copyright Owner:||Copyright 2004 American Institute of Physics|
|Deposited On:||14 Jul 2014 03:00|
|Last Modified:||15 Jul 2014 01:53|
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