High-rate, room temperature plasma-enhanced deposition of aluminum-doped zinc oxide nanofilms for solar cell applications

Chua, B.S., Xu, S., Ren, Y.P., Cheng, Q.J., & Ostrikov, K. (2009) High-rate, room temperature plasma-enhanced deposition of aluminum-doped zinc oxide nanofilms for solar cell applications. Journal of Alloys and Compounds, 485(1-2), pp. 379-384.

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A custom-designed inductively coupled plasma (ICP)-assisted radio-frequency magnetron sputtering deposition system has been employed to synthesize aluminium-doped zinc oxide (ZnO:Al) nanofilms on glass substrates at room temperature. The effects of film thickness and ZnO target (partially covered by Al chips) power on the structural, electrical and optical properties of the ZnO:Al nanofilms are studied. A high growth rate (∼41 nm/min), low electrical sheet resistance (as low as 30 Ω/□) and high optical transparency (>80%) over the visible spectrum has been achieved at a film thickness of ∼615 nm and ZnO target power of 150 W. The synthesis of ZnO:Al nanofilms at room temperature and with high growth rates is attributed to the unique features of the ICP-assisted radio-frequency magnetron sputtering deposition approach. The results are relevant to the development of photovoltaic thin-film solar cells and flat panel displays.

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29 citations in Scopus
27 citations in Web of Science®
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ID Code: 73933
Item Type: Journal Article
Refereed: Yes
Additional URLs:
Keywords: Aluminum doping, Low-temperature plasmas, Thin-film solar cells, Zinc oxide
DOI: 10.1016/j.jallcom.2009.05.099
ISSN: 0925-8388
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Deposited On: 15 Jul 2014 00:57
Last Modified: 22 Jun 2017 00:01

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