Nanocrystalline vanadium oxide films synthesized by plasma-assisted reactive rf sputtering deposition

Lim, S. P., Long, J. D., Xu, S., & Ostrikov, K. (2007) Nanocrystalline vanadium oxide films synthesized by plasma-assisted reactive rf sputtering deposition. Journal of Physics D: Applied Physics, 40(4), pp. 1085-1090.

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Plasma-assisted reactive rf magnetron sputtering deposition is used to fabricate vanadium oxide films on glass, silica and silicon substrates. The process conditions are optimized to synthesize phase-pure vanadium pentoxide (V2O5) featuring a nanocrystalline structure with the predominant (0 0 1) crystallographic orientation, surface morphology with rod-like nanosized grains and very uniform (the non-uniformity does not exceed 4%) coating thickness over large surface areas. The V2O5 films also show excellent and temperature-independent optical transmittance in a broad temperature range (20-95 °C). The results are relevant to the development of smart functional coatings with temperature-tunable properties. © 2007 IOP Publishing Ltd.

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ID Code: 73951
Item Type: Journal Article
Refereed: Yes
Additional URLs:
DOI: 10.1088/0022-3727/40/4/026
ISSN: 0022-3727
Divisions: Current > Schools > School of Chemistry, Physics & Mechanical Engineering
Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: © 2007 IOP Publishing Ltd.
Deposited On: 16 Jul 2014 00:09
Last Modified: 17 Jul 2014 03:29

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