Carbon saturation of arrays of Ni catalyst nanoparticles of different size and pattern uniformity on a silicon substrate

Levchenko, I. & Ostrikov, K. (2008) Carbon saturation of arrays of Ni catalyst nanoparticles of different size and pattern uniformity on a silicon substrate. Nanotechnology, 19(33).

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The kinetics of saturation of Ni catalyst nanoparticle patterns of the three different degrees of order, used as a model for the growth of carbon nanotips on Si, is investigated numerically using a complex model that involves surface diffusion and ion motion equations. It is revealed that Ni catalyst patterns of different degrees of order, with Ni nanoparticle sizes up to 12.5 nm, exhibit different kinetics of saturation with carbon on the Si surface. It is shown that in the cases examined (surface coverage in the range of 1-50%, highly disordered Ni patterns) the relative pattern saturation factor calculated as the ratio of average incubation times for the processes conducted in the neutral and ionized gas environments reaches 14 and 3.4 for Ni nanoparticles of 2.5 and 12.5 nm, respectively. In the highly ordered Ni patterns, the relative pattern saturation factor reaches 3 for nanoparticles of 2.5 nm and 2.1 for nanoparticles of 12.5 nm. Thus, more simultaneous saturation of Ni catalyst nanoparticles of sizes in the range up to 12.5 nm, deposited on the Si substrate, can be achieved in the low-temperature plasma environment than with the neutral gas-based process.

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25 citations in Web of Science®

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ID Code: 73956
Item Type: Journal Article
Refereed: Yes
Additional URLs:
Keywords: surfaces, interfaces, thin films, nanoscale science, low-D systems
DOI: 10.1088/0957-4484/19/33/335703
ISSN: 1361-6528
Divisions: Current > Schools > School of Chemistry, Physics & Mechanical Engineering
Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: Copyright 2008 Institute of Physics Publishing Ltd.
Deposited On: 15 Jul 2014 22:17
Last Modified: 16 Jul 2014 23:14

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