Self-assembled low-dimensional nanomaterials via low-temperature plasma processing

Ostrikov, K., Levchenko, I., Xu, S., Huang, S.Y., Cheng, Q.J., Long, J.D., & Xu, M. (2008) Self-assembled low-dimensional nanomaterials via low-temperature plasma processing. Thin Solid Films, 516(19), pp. 6609-6615.

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Abstract

Examples of successful fabrication of low-dimensional semiconducting nanomaterials in the Integrated Plasma-Aided Nanofabrication Facility are shown. Self-assembled size-uniform ZnO nanoparticles, ultra-high-aspect ratio Si nanowires, vertically aligned cadmium sulfide nanostructures, and quarternary semiconducting SiCAlN nanomaterial have been synthesized using inductively coupled plasma-assisted RF magnetron sputtering deposition. The observed increase in crystallinity and growth rates of the nanostructures are explained by using a model of plasma-enhanced adatom surface diffusion under conditions of local energy exchange between the ion flux and the growth surface. Issues related to plasma-based growth of low-dimensional semiconducting nanomaterials are discussed as well. © 2007 Elsevier B.V. All rights reserved.

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16 citations in Web of Science®

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ID Code: 73969
Item Type: Journal Article
Refereed: Yes
Additional Information: Paper presented in the 20th Symposium on Plasma Science for Materials (SPSM-20)
Additional URLs:
Keywords: Low-dimensional semiconductors, Nanoparticles, Nanostructures, Nanowires, Plasma nanofabrication
DOI: 10.1016/j.tsf.2007.11.045
ISSN: 0040-6090
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Deposited On: 15 Jul 2014 04:28
Last Modified: 15 Jul 2014 22:56

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