Self-assembled low-dimensional nanomaterials via low-temperature plasma processing
Ostrikov, K., Levchenko, I., Xu, S., Huang, S.Y., Cheng, Q.J., Long, J.D., & Xu, M. (2008) Self-assembled low-dimensional nanomaterials via low-temperature plasma processing. Thin Solid Films, 516(19), pp. 6609-6615.
Examples of successful fabrication of low-dimensional semiconducting nanomaterials in the Integrated Plasma-Aided Nanofabrication Facility are shown. Self-assembled size-uniform ZnO nanoparticles, ultra-high-aspect ratio Si nanowires, vertically aligned cadmium sulfide nanostructures, and quarternary semiconducting SiCAlN nanomaterial have been synthesized using inductively coupled plasma-assisted RF magnetron sputtering deposition. The observed increase in crystallinity and growth rates of the nanostructures are explained by using a model of plasma-enhanced adatom surface diffusion under conditions of local energy exchange between the ion flux and the growth surface. Issues related to plasma-based growth of low-dimensional semiconducting nanomaterials are discussed as well. © 2007 Elsevier B.V. All rights reserved.
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|Item Type:||Journal Article|
|Additional Information:||Paper presented in the 20th Symposium on Plasma Science for Materials (SPSM-20)|
|Keywords:||Low-dimensional semiconductors, Nanoparticles, Nanostructures, Nanowires, Plasma nanofabrication|
|Divisions:||Current > QUT Faculties and Divisions > Science & Engineering Faculty|
|Deposited On:||15 Jul 2014 04:28|
|Last Modified:||15 Jul 2014 22:56|
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