Multi-scale hybrid numerical simulation of the growth of high-aspect-ratio nanostructures

Tam, E., Ostrikov, K., Levchenko, I., Keidar, M., & Xu, S. (2008) Multi-scale hybrid numerical simulation of the growth of high-aspect-ratio nanostructures. Computational Materials Science, 44(1), pp. 9-15.

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Abstract

Recently, a variety high-aspect-ratio nanostructures have been grown and profiled for various applications ranging from field emission transistors to gene/drug delivery devices. However, fabricating and processing arrays of these structures and determining how changing certain physical parameters affects the final outcome is quite challenging. We have developed several modules that can be used to simulate the processes of various physical vapour deposition systems from precursor interaction in the gas phase to gas-surface interactions and surface processes. In this paper, multi-scale hybrid numerical simulations are used to study how low-temperature non-equilibrium plasmas can be employed in the processing of high-aspect-ratio structures such that the resulting nanostructures have properties suitable for their eventual device application. We show that whilst using plasma techniques is beneficial in many nanofabrication processes, it is especially useful in making dense arrays of high-aspect-ratio nanostructures.

Impact and interest:

1 citations in Scopus
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ID Code: 73973
Item Type: Journal Article
Refereed: Yes
Additional Information: International Conference on Materials for Advanced Technologies 2007 (ICMAT 2007) Selected papers of Symposium O: Frontiers in Computational Materials Science
Additional URLs:
Keywords: Carbon nanotubes, Multi-scale hybrid simulations, Nanostructures, Physical vapour deposition, Plasma
DOI: 10.1016/j.commatsci.2008.01.048
ISSN: 0927-0256
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Deposited On: 15 Jul 2014 04:11
Last Modified: 15 Jul 2014 22:38

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