Reactive species in Ar+H2 plasma-aided nanofabrication : two-dimensional discharge modelling

Ostrikov, K., Yoon, H.J., Rider, A.E., & Ligatchev, V. (2007) Reactive species in Ar+H2 plasma-aided nanofabrication : two-dimensional discharge modelling. Physica Scripta, 76(2), pp. 187-195.

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Understanding the generation of reactive species in a plasma is an important step towards creating reliable and robust plasma-aided nanofabrication processes. A two-dimensional fluid simulation of the number densities of surface preparation species in a low-temperature, low-pressure, non-equilibrium Ar+H2 plasma is conducted. The operating pressure and H2 partial pressure have been varied between 70-200 mTorr and 0.1-50%, respectively. An emphasis is placed on the application of these results to nanofabrication. A reasonable balance between operating pressures and H 2 partial pressures that would optimize the number densities of the two working units largely responsible for activation and passivation of surface dangling bonds (Ar+ and H respectively) in order to achieve acceptable rates of surface activation and passivation is obtained. It is found that higher operating pressures (150-200 mTorr) and lower H2 partial pressures (∼5%) are required in order to ensure high number densities of Ar+ and H species. This paper contributes to the improvement of the controllability and predictability of plasma-based nanoassembly processes.

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ID Code: 74007
Item Type: Journal Article
Refereed: Yes
Additional URLs:
DOI: 10.1088/0031-8949/76/2/011
ISSN: 0031-8949
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Deposited On: 17 Jul 2014 03:22
Last Modified: 17 Jul 2014 23:33

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