Simulation of gas-phase nanoparticle dynamics in the plasma-enhanced chemical vapor deposition of carbon nanostructures

Rutkevych, P.P., Ostrikov, K., Denysenko, I.B., Storer, R.G., & Xu, S. (2004) Simulation of gas-phase nanoparticle dynamics in the plasma-enhanced chemical vapor deposition of carbon nanostructures. Physica Scripta, 70(5), pp. 322-325.

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Abstract

The results of 1D simulation of nanoparticle dynamics in the areas adjacent to nanostructured carbon-based films exposed to chemically active complex plasma of CH4 + H2 + Ar gas mixtures are presented. The nanoparticle-loaded near-substrate (including sheath and presheath) areas of a low-frequency (0.5 MHz) inductively coupled plasma facility for the PECVD growth of the ordered carbon-based nanotip structures are considered. The conditions allowing one to predict the size of particles that can pass through the plasma sheath and softly land onto the surface are formulated. The possibility of soft nano-cluster deposition without any additional acceleration common for some existing nano-cluster deposition schemes is demonstrated. The effect of the substrate heating power and the average atomic mass of neutral species is studied numerically and verified experimentally.

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5 citations in Web of Science®

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ID Code: 74010
Item Type: Journal Article
Refereed: Yes
Additional URLs:
DOI: 10.1088/0031-8949/70/5/010
ISSN: 0031-8949
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Deposited On: 17 Jul 2014 01:41
Last Modified: 18 Jul 2014 00:33

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