Two-dimensional simulation of nanoparticle deposition from high-density plasmas on microstructured surfaces
Rutkevych, P.P., Ostrikov, K., & Xu, S. (2007) Two-dimensional simulation of nanoparticle deposition from high-density plasmas on microstructured surfaces. Physics of Plasmas, 14(4), 043502-1.
Selective and controlled deposition of plasma-grown nanoparticles is one of the pressing problems of plasma-aided nanofabrication. The results of advanced numerical simulations of motion of charge-variable nanoparticles in the plasma presheath and sheath areas and in localized microscopic electric fields created by surface microstructures are reported. Conditions for site-selective deposition of such nanoparticles onto individual microstructures and open surface areas within a periodic micropattern are formulated. The effects of plasma parameters, surface potential, and micropattern features on nanoparticle deposition are investigated and explained using particle charging and plasma force arguments. The results are generic and applicable to a broad range of nanoparticle-generating plasmas and practical problems ranging from management of nanoparticle contamination in microelectronics to site-selective nanoparticle deposition into specified device locations, and synthesis of advanced microporous materials and nanoparticle superlattices. © 2007 American Institute of Physics.
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|Item Type:||Journal Article|
|Divisions:||Current > QUT Faculties and Divisions > Science & Engineering Faculty|
|Copyright Owner:||Copyright 2007 American Institute of Physics|
|Deposited On:||16 Jul 2014 04:19|
|Last Modified:||17 Jul 2014 02:37|
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