Reactive plasmas as a versatile nanofabrication tool

Ostrikov, K. (2005) Reactive plasmas as a versatile nanofabrication tool. Reviews of Modern Physics, 77(2), pp. 489-511.

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The underlying physics of the application of low-temperature, low-pressure reactive plasmas in various nanoassembly processes is described. From the viewpoint of the "cause and effect" approach, this Colloquium focuses on the benefits and challenges of using plasma-based systems in nanofabrication of nanostructured silicon films, low-dimensional semiconducting quantum structures, ordered carbon nanotip arrays, highly crystalline TiO2 coatings, and nanostructured hydroxyapatite bioceramics. Other examples and future prospects of plasma-aided nanofabrication are also discussed. © 2005 The American Physical Society.

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ID Code: 74153
Item Type: Journal Article
Refereed: Yes
Additional URLs:
DOI: 10.1103/RevModPhys.77.489
ISSN: 0034-6861
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: Copyright 2005 American Physical Society
Deposited On: 21 Jul 2014 01:43
Last Modified: 24 Apr 2015 02:03

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