Internal oscillating current-sustained RF plasmas : Parameters, stability, and potential for surface engineering

Ostrikov, K., Tsakadze, E.L., Tsakadze, Z.L., & Xu, S. (2005) Internal oscillating current-sustained RF plasmas : Parameters, stability, and potential for surface engineering. Surface and Coatings Technology, 200(1-4), pp. 796-799.

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A new source of low-frequency (0.46 MHz) inductively coupled plasmas sustained by the internal planar "unidirectional" RF current driven through a specially designed internal antenna configuration has been developed. The experimental results of the investigation of the optical and global argon plasma parameters by the optical and Langmuir probes are presented. It is shown that the spatial profiles of the electron density, the effective electron temperature and plasma potential feature a great deal of the radial and axial uniformity compared with conventional sources of inductively coupled plasmas with external at coil configurations. The measurements also reveal a weak azimuthal dependence of the global plasma parameters at low values of the input RF power, which was earlier predicted theoretically. The azimuthal dependence of the global plasma parameters vanishes at high input RF powers. Moreover, under certain conditions, the plasma becomes unstable due to spontaneous transitions between low-density (electrostatic, E) and high-density (electromagnetic, H) operating modes. Excellent uniformity of high-density plasmas makes the plasma reactor promising for various plasma processing applications and surface engineering.

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ID Code: 74157
Item Type: Journal Article
Refereed: Yes
Additional Information: Paper presented in Plasma Surface Engineering (PSE 2004) Conference
Additional URLs:
Keywords: PACVD, Plasma diagnostics, Plasma sources, Radio frequency plasma
DOI: 10.1016/j.surfcoat.2005.01.059
ISSN: 0257-8972
Deposited On: 21 Jul 2014 01:32
Last Modified: 22 Jul 2014 00:08

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