Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions
Ostrikov, K., Kumar, S., & Sugai, H. (2001) Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions. Physics of Plasmas, 8(7), pp. 3490-3497.
Charging and trapping of macroparticles in the near-electrode region of fluorocarbon etching plasmas with negative ions is considered. The equilibrium charge and forces on particles are computed as a function of the local position in the plasma presheath and sheath. The ionic composition of the plasma corresponds to the etching experiments in 2.45 GHz surface-wave sustained and 13.56 MHz inductively coupled C4F8+Ar plasmas. It is shown that despite negligible negative ion currents collected by the particles, the negative fluorine ions affect the charging and trapping of particulates through modification of the sheath/presheath structure.
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|Item Type:||Journal Article|
|Keywords:||Plasma materials processing, Ion trapping, Inductively coupled plasma|
|Divisions:||Current > QUT Faculties and Divisions > Science & Engineering Faculty|
|Copyright Owner:||Copyright 2001 American Institute of Physics|
|Deposited On:||21 Jul 2014 04:05|
|Last Modified:||21 Jul 2014 04:05|
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