Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions

Ostrikov, K., Kumar, S., & Sugai, H. (2001) Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions. Physics of Plasmas, 8(7), pp. 3490-3497.

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Charging and trapping of macroparticles in the near-electrode region of fluorocarbon etching plasmas with negative ions is considered. The equilibrium charge and forces on particles are computed as a function of the local position in the plasma presheath and sheath. The ionic composition of the plasma corresponds to the etching experiments in 2.45 GHz surface-wave sustained and 13.56 MHz inductively coupled C4F8+Ar plasmas. It is shown that despite negligible negative ion currents collected by the particles, the negative fluorine ions affect the charging and trapping of particulates through modification of the sheath/presheath structure.

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ID Code: 74170
Item Type: Journal Article
Refereed: Yes
Additional URLs:
Keywords: Plasma materials processing, Ion trapping, Inductively coupled plasma
DOI: 10.1063/1.1375149
ISSN: 1070-664X
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: Copyright 2001 American Institute of Physics
Deposited On: 21 Jul 2014 04:05
Last Modified: 21 Jul 2014 04:05

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