Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions

Ostrikov, K., Kumar, S., & Sugai, H. (2001) Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions. Physics of Plasmas, 8(7), pp. 3490-3497.

View at publisher

Abstract

Charging and trapping of macroparticles in the near-electrode region of fluorocarbon etching plasmas with negative ions is considered. The equilibrium charge and forces on particles are computed as a function of the local position in the plasma presheath and sheath. The ionic composition of the plasma corresponds to the etching experiments in 2.45 GHz surface-wave sustained and 13.56 MHz inductively coupled C4F8+Ar plasmas. It is shown that despite negligible negative ion currents collected by the particles, the negative fluorine ions affect the charging and trapping of particulates through modification of the sheath/presheath structure.

Impact and interest:

41 citations in Scopus
Search Google Scholar™
63 citations in Web of Science®

Citation counts are sourced monthly from Scopus and Web of Science® citation databases.

These databases contain citations from different subsets of available publications and different time periods and thus the citation count from each is usually different. Some works are not in either database and no count is displayed. Scopus includes citations from articles published in 1996 onwards, and Web of Science® generally from 1980 onwards.

Citations counts from the Google Scholar™ indexing service can be viewed at the linked Google Scholar™ search.

Full-text downloads:

52 since deposited on 21 Jul 2014
21 in the past twelve months

Full-text downloads displays the total number of times this work’s files (e.g., a PDF) have been downloaded from QUT ePrints as well as the number of downloads in the previous 365 days. The count includes downloads for all files if a work has more than one.

ID Code: 74170
Item Type: Journal Article
Refereed: Yes
Additional URLs:
Keywords: Plasma materials processing, Ion trapping, Inductively coupled plasma
DOI: 10.1063/1.1375149
ISSN: 1070-664X
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: Copyright 2001 American Institute of Physics
Deposited On: 21 Jul 2014 04:05
Last Modified: 21 Jul 2014 04:05

Export: EndNote | Dublin Core | BibTeX

Repository Staff Only: item control page