E and H regimes of plasma enhanced chemical vapor deposition of diamond-like carbon film in low frequency inductively coupled plasma reactor

Sun, Z., Xu, S., & Ostrikov, K. (2002) E and H regimes of plasma enhanced chemical vapor deposition of diamond-like carbon film in low frequency inductively coupled plasma reactor. Diamond and Related Materials, 11(1), pp. 92-97.

View at publisher

Abstract

This paper reports on the efficient deposition of hydrogenated diamond-like carbon (DLC) film in a plasma reactor that features both the capacitively and inductively coupled operation regimes. The hydrogenated DLC films have been prepared on silicon wafers using a low-frequency (500 kHz) inductively coupled plasma (ICP) chemical vapor deposition (CVD) system. At low RF powers, the system operates as an asymmetric capacitively coupled plasma source, and the film deposition process is undertaken in the electrostatic (E) discharge regime. Above the mode transition threshold, the high-density inductively coupled plasma is produced in the electromagnetic (H) discharge regime. It has been shown that the deposition rate and hardness of the DLC film are much higher in the H-mode deposition regime. For a 2.66-Pa H-mode CH4 + Ar gas mixture discharge, the deposited DLC film exhibits a mechanical hardness of 18 GPa, Young's modulus of 170 GPa, and compressive stress of 1.3 GPa.

Impact and interest:

4 citations in Scopus
Search Google Scholar™
4 citations in Web of Science®

Citation counts are sourced monthly from Scopus and Web of Science® citation databases.

These databases contain citations from different subsets of available publications and different time periods and thus the citation count from each is usually different. Some works are not in either database and no count is displayed. Scopus includes citations from articles published in 1996 onwards, and Web of Science® generally from 1980 onwards.

Citations counts from the Google Scholar™ indexing service can be viewed at the linked Google Scholar™ search.

ID Code: 74176
Item Type: Journal Article
Refereed: Yes
Additional URLs:
Keywords: Diamond-like carbon, Inductively coupled plasma, Mode transitions, Plasma enhanced chemical vapor deposition
DOI: 10.1016/S0925-9635(01)00524-6
ISSN: 0925-9635
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Deposited On: 21 Jul 2014 03:55
Last Modified: 21 Jul 2014 03:55

Export: EndNote | Dublin Core | BibTeX

Repository Staff Only: item control page