Control and diagnostics of inductively coupled plasmas for chemical vapour deposition of nanocomposite carbon nitride-based films

Tsakadze, E., Ostrikov, K., Tsakadze, Z., Jiang, N., Ahmad, R., & Xu, S. (2002) Control and diagnostics of inductively coupled plasmas for chemical vapour deposition of nanocomposite carbon nitride-based films. International Journal of Modern Physics B, 16(6-7), pp. 1143-1147.

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Abstract

Control and diagnostics of low-frequency (∼ 500 kHz) inductively coupled plasmas for chemical vapor deposition (CVD) of nano-composite carbon nitride-based films is reported. Relation between the discharge control parameters, plasma electron energy distribution/probability functions (EEDF/EEPF), and elemental composition in the deposited C-N based thin films is investigated. Langmuir probe technique is employed to monitor the plasma density and potential, effective electron temperature, and EEDFs/EEPFs in Ar + N2 + CH4 discharges. It is revealed that varying RF power and gas composition/pressure one can engineer the EEDFs/EEPFs to enhance the desired plasma-chemical gas-phase reactions thus controlling the film chemical structure. Auxiliary diagnostic tools for study of the RF power deposition, plasma composition, stability, and optical emission are discussed as well.

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ID Code: 74178
Item Type: Journal Article
Refereed: Yes
Additional URLs:
DOI: 10.1142/S0217979202011019
ISSN: 0217-9792
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Deposited On: 21 Jul 2014 04:22
Last Modified: 21 Jul 2014 04:22

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