Self-assembly of uniform carbon nanotip structures in chemically active inductively coupled plasmas
Tsakadze, Z.L., Ostrikov, K., Long, J.D., & Xu, S. (2004) Self-assembly of uniform carbon nanotip structures in chemically active inductively coupled plasmas. Diamond and Related Materials, 13(10), pp. 1923-1929.
Self-assembly of carbon nanotip (CNTP) structures on Ni-based catalyst in chemically active inductively coupled plasmas of CH 4 + H 2 + Ar gas mixtures is reported. By varying the process conditions, it appears possible to control the shape, size, and density of CNTPs, content of the nanocrystalline phase in the films, as well as to achieve excellent crystallinity, graphitization, uniformity and vertical alignment of the resulting nanostructures at substrate temperatures 300-500°C and low gas pressures (below 13.2 Pa). This study provides a simple and efficient plasma-enhanced chemical vapor deposition (PECVD) technique for the fabrication of vertically aligned CNTP arrays for electron field emitters.
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|Item Type:||Journal Article|
|Keywords:||Electronic device structures, Etching, Nanoparticles, Nanostructures, Plasma CVD, Surface microscopy, Surface structure|
|Divisions:||Current > QUT Faculties and Divisions > Science & Engineering Faculty|
|Deposited On:||21 Jul 2014 03:01|
|Last Modified:||22 Jul 2014 01:06|
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