Effect of ion current density on the properties of vacuum arc-deposited TiN coatings

Baranov, Oleg O., Fang, Jinghua, Rider, Amanda E., Kumar, Shailesh, & Ostrikov, Kostya (2013) Effect of ion current density on the properties of vacuum arc-deposited TiN coatings. IEEE Transactions on Plasma Science, 41(12), pp. 3640-3644.

View at publisher


The influence of ion current density on the thickness of coatings deposited in a vacuum arc setup has been investigated to optimize the coating porosity. A planar probe was used to measure the ion current density distribution across plasma flux. A current density from 20 to 50 A/m2 was obtained, depending on the probe position relative to the substrate center. TiN coatings were deposited onto the cutting inserts placed at different locations on the substrate, and SEM was used to characterize the surfaces of the coatings. It was found that lowdensity coatings were formed at the decreased ion current density. A quantitative dependence of the coating thickness on the ion current density in the range of 20-50 A/m2 were obtained for the films deposited at substrate bias of 200 V and nitrogen pressure 0.1 Pa, and the coating porosity was calculated. The coated cutting inserts were tested by lathe machining of the martensitic stainless steel AISI 431. The results may be useful for controlling ion flux distribution over large industrial-scale substrates.

Impact and interest:

4 citations in Scopus
4 citations in Web of Science®
Search Google Scholar™

Citation counts are sourced monthly from Scopus and Web of Science® citation databases.

These databases contain citations from different subsets of available publications and different time periods and thus the citation count from each is usually different. Some works are not in either database and no count is displayed. Scopus includes citations from articles published in 1996 onwards, and Web of Science® generally from 1980 onwards.

Citations counts from the Google Scholar™ indexing service can be viewed at the linked Google Scholar™ search.

Full-text downloads:

69 since deposited on 04 Aug 2014
16 in the past twelve months

Full-text downloads displays the total number of times this work’s files (e.g., a PDF) have been downloaded from QUT ePrints as well as the number of downloads in the previous 365 days. The count includes downloads for all files if a work has more than one.

ID Code: 74697
Item Type: Journal Article
Refereed: Yes
Keywords: DC discharges, ion-assisted deposition, process control, thin films
DOI: 10.1109/TPS.2013.2286405
ISSN: 1939-9375
Divisions: Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: Copyright 2013 IEEE
Copyright Statement: Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works.
Deposited On: 04 Aug 2014 23:15
Last Modified: 22 Jun 2017 05:01

Export: EndNote | Dublin Core | BibTeX

Repository Staff Only: item control page