Nitrogen ion implanted nanostructured titania films used in dye-sensitised solar cells and photocatalyst
Tesfamichael, Tuquabo, Will, Geoffrey D., & Bell, John M. (2005) Nitrogen ion implanted nanostructured titania films used in dye-sensitised solar cells and photocatalyst. Applied Surface Science, 245(1-4), pp. 172-178.
Nanostructured titania films were implanted with N at energies between 10 and 40 keV and ion dose range 1014–5x1016 cm-2 and the films were characterized using various techniques. The surface morphology of the nanostructured films has been modified with ion implantation as observed using SEM. From SIMS depth profile analysis the amount of nitrogen was found to increase with increasing ion energy. The profile of N appeared to have a skewed Gaussian curve and the results have been explained using SRIM theoretical simulations. A maximum nitrogen concentration of about 6.08 at% has been quantified by XPS. Transmittance of the films decreases with increasing implantation energy and ion dose due to defects created by the ion implantation. Annealing can remove defects and thereby increase the transmittance of the films.
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|Item Type:||Journal Article|
|Additional Information:||For more information, please refer to the journal’s website (see hypertext link) or contact the author.|
|Keywords:||Nanocrystalline titania, N ion implantation, Surface morphology, Optical properties, N depth profiling|
|Subjects:||Australian and New Zealand Standard Research Classification > ENGINEERING (090000) > MATERIALS ENGINEERING (091200)
Australian and New Zealand Standard Research Classification > ENGINEERING (090000) > MATERIALS ENGINEERING (091200) > Materials Engineering not elsewhere classified (091299)
|Divisions:||Past > QUT Faculties & Divisions > Faculty of Built Environment and Engineering|
|Copyright Owner:||Copyright 2007 Elsevier|
|Deposited On:||15 May 2007 00:00|
|Last Modified:||29 Feb 2012 13:11|
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