Development of a novel cathodic plasma/electrolytic deposition technique part 2: Physico-chemical analysis of the plasma discharge

Paulmier, Thierry, Bell, John M., & Fredericks, Peter M. (2007) Development of a novel cathodic plasma/electrolytic deposition technique part 2: Physico-chemical analysis of the plasma discharge. Surface and Coatings Technology, 201(21), pp. 8771-8781.


View at publisher


A novel plasma system has been developed recently for the deposition of carbon and titanium thin films on metal and metal alloy substrates. Unlike other deposition techniques, the process occurs in liquid precursors and a plasma discharge is created and confined around the cathode in a superheated vapour sheath surrounded by the liquid phase. This paper presents a detailed analysis on the physico-chemical mechanisms underlying this process. A correlation has then been carried out between the voltage / current characteristics of the process and the consecutive physical phenomena occurring during the process (vapour phase formation, plasma discharge initiation and evolution). A description of the different coatings (graphite and titanium dioxide) deposited with this technique has been carried out with an attempt to correlate the structure and composition of these films with the composition and physical characteristics of the plasma discharge. This analysis allowed the construction of a first dissociation and deposition mechanism for this new plasma system.

Impact and interest:

22 citations in Scopus
Search Google Scholar™
24 citations in Web of Science®

Citation counts are sourced monthly from Scopus and Web of Science® citation databases.

These databases contain citations from different subsets of available publications and different time periods and thus the citation count from each is usually different. Some works are not in either database and no count is displayed. Scopus includes citations from articles published in 1996 onwards, and Web of Science® generally from 1980 onwards.

Citations counts from the Google Scholar™ indexing service can be viewed at the linked Google Scholar™ search.

Full-text downloads:

592 since deposited on 10 Aug 2007
23 in the past twelve months

Full-text downloads displays the total number of times this work’s files (e.g., a PDF) have been downloaded from QUT ePrints as well as the number of downloads in the previous 365 days. The count includes downloads for all files if a work has more than one.

ID Code: 8939
Item Type: Journal Article
Refereed: Yes
Keywords: plasma electrolysis, glow discharge, micro, arc discharge, thin film deposition
DOI: 10.1016/j.surfcoat.2006.07.066
ISSN: 0257-8972
Divisions: Past > QUT Faculties & Divisions > Faculty of Science and Technology
Copyright Owner: Copyright 2007 Elsevier
Copyright Statement: Reproduced in accordance with the copyright policy of the publisher.
Deposited On: 10 Aug 2007 00:00
Last Modified: 29 Feb 2012 13:31

Export: EndNote | Dublin Core | BibTeX

Repository Staff Only: item control page