Patterned growth of nanoscale in clusters on the Si(111)-7×7 and Si(111)-Ge(5×5) reconstructions

MacLeod, J.M., Psiachos, D., Mark, A.G., Stott, M.J., & McLean, A.B. (2007) Patterned growth of nanoscale in clusters on the Si(111)-7×7 and Si(111)-Ge(5×5) reconstructions. Journal of Physics: Conference Series, 61, pp. 800-804.

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Results of a study designed to investigate the possibility of using the Si(111)- Ge(5×5) surface reconstruction as a template for In cluster growth are described. As with Si(111)-7×7, the In adatoms preferentially adsorb in the faulted half-unit cell, but on Si(111)- Ge(5×5) a richer variety of cluster geometries are found. In addition to the clusters that occupy the faulted half-unit cell, clusters that span two and four half-unit cells are found. The latter have a triangular shape spanning one unfaulted and three, nearest neighbor, faulted half-unit cells, Triangular clusters in the opposite orientation were not found. Many of the faulted halfunit cells have a streaked appearance consistent with adatom mobility.

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ID Code: 89953
Item Type: Journal Article
Refereed: No
DOI: 10.1088/1742-6596/61/1/160
ISSN: 1742-6596
Divisions: Current > Schools > School of Chemistry, Physics & Mechanical Engineering
Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: Copyright 2007 IOP Publishing Ltd
Deposited On: 04 Apr 2016 01:00
Last Modified: 20 Apr 2016 05:07

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