Thin nanoporous metal-insulator-metal membranes
Aramesh, Morteza, Djalalian-Assl, Amir, Aghili Yajadda, Mir Massoud, Prawer, Steven, & Ostrikov, Kostya (2016) Thin nanoporous metal-insulator-metal membranes. ACS applied materials & interfaces, 8(7), pp. 4292-4297.
Insulating nanoporous materials are promising platforms for soft-ionizing membranes; however, improvement in fabrication processes and the quality and high breakdown resistance of the thin insulator layers are needed for high integration and performance. Here, scalable fabrication of highly porous, thin, silicon dioxide membranes with controlled thickness is demonstrated using plasma-enhanced chemical-vapor-deposition. The fabricated membranes exhibit good insulating properties with a breakdown voltage of 1 × 107 V/cm. Our calculations suggest that the average electric field inside a nanopore of the membranes can be as high as 1 × 106 V/cm; sufficient for ionization of wide range of molecules. These metal–insulator–metal nanoporous arrays are promising for applications such soft ionizing membranes for mass spectroscopy.
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|Item Type:||Journal Article|
|Keywords:||nanoporous materials, soft ionizing membrane (SIM), plasma-enhanced chemical-vapor-deposition, thin films, dielectric breakdown;|
|Divisions:||Current > Schools > School of Chemistry, Physics & Mechanical Engineering
Current > Institutes > Institute for Future Environments
Current > QUT Faculties and Divisions > Science & Engineering Faculty
|Facilities:||Central Analytical Research Facility|
|Deposited On:||17 Mar 2016 05:19|
|Last Modified:||18 Mar 2016 01:01|
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