Unravelling the self-assembly of hydrogen bonded NDI semiconductors in 2D and 3D

Fu, Chaoying, Lin, Hua-Ping, MacLeod, Jennifer M., Krayev, Andrey, Rosei, Federico, & Perepichka, Dmitrii F. (2016) Unravelling the self-assembly of hydrogen bonded NDI semiconductors in 2D and 3D. Chemistry of Materials, 28(3), pp. 951-961.

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Supramolecular ordering of organic semiconductors is the key factor defining their electrical characteristics. Yet, it is extremely difficult to control, particularly at the interface with metal and dielectric surfaces in semiconducting devices. We have explored the growth of n-type semiconducting films based on hydrogen-bonded monoalkylnaphthalenediimide (NDI-R) from solution and through vapor deposition on both conductive and insulating surfaces. We combined scanning tunneling and atomic force microscopies with X-ray diffraction analysis to characterize, at the submolecular level, the evolution of the NDI-R molecular packing in going from monolayers to thin films. On a conducting (graphite) surface, the first monolayer of NDI-R molecules adsorbs in a flat-lying (face-on) geometry, whereas in subsequent layers the molecules pack edge-on in islands (Stranski–Krastanov-like growth). On SiO2, the NDI-R molecules form into islands comprising edge-on packed molecules (Volmer–Weber mode). Under all the explored conditions, self-complementary H bonding of the imide groups dictates the molecular assembly. The measured electron mobility of the resulting films is similar to that of dialkylated NDI molecules without H bonding. The work emphasizes the importance of H bonding interactions for controlling the ordering of organic semiconductors, and demonstrates a connection between on-surface self-assembly and the structural parameters of thin films used in electronic devices.

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7 citations in Scopus
5 citations in Web of Science®
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ID Code: 94467
Item Type: Journal Article
Refereed: Yes
DOI: 10.1021/acs.chemmater.5b04706
ISSN: 1520-5002
Divisions: Current > Schools > School of Chemistry, Physics & Mechanical Engineering
Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: Copyright 2016 American Chemical Society
Deposited On: 06 Apr 2016 23:13
Last Modified: 08 Apr 2016 03:07

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