Electrophoretic deposition of Ti3Si(Al)C2 from aqueous suspension

Liang, Y., Sun, Ziqi, Chen, J., Liu, X., & Zhou, Y. (2010) Electrophoretic deposition of Ti3Si(Al)C2 from aqueous suspension. Journal of the American Chemical Society, 93(7), pp. 1916-1921.

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Ti3Si(Al)C2 films were electrophoretically deposited at 3 V on indium-tin-oxide (ITO) conductive glass from Ti3Si(Al) C2 aqueous suspension with 1 vol% solid loading at pH 9 in the absence of any dispersant. The surface morphology, cross section microstructure, and preferred orientation of the films were investigated by scanning electron microscopy and X-ray diffraction. The as-deposited Ti3Si(Al)C 2 films exhibited (00l) preferred orientation and the thickness can be controlled by the deposition-drying-deposition method. These results demonstrate that electrophoretic deposition is a simple and feasible method to prepare MAX-phases green films at room temperature.

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ID Code: 94634
Item Type: Journal Article
Refereed: Yes
DOI: 10.1111/j.1551-2916.2010.03682.x
ISSN: 0002-7863
Divisions: Current > Schools > School of Chemistry, Physics & Mechanical Engineering
Current > QUT Faculties and Divisions > Science & Engineering Faculty
Copyright Owner: Copyright 2010 American Chemical Society
Deposited On: 11 Apr 2016 04:57
Last Modified: 18 Apr 2016 06:16

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