Development of porous metal oxide thin films by co-evaporation

Tesfamichael, Tuquabo, Motta, Nunzio, Bostrom, Thor E., & Bell, John M. (2006) Development of porous metal oxide thin films by co-evaporation. Applied Surface Science, 253(11), pp. 4853-4859.


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This paper focuses on the development of mixed metal oxide thin films and physical characterization of the films. The films were produced by co-evaporation of titanium oxide and tungsten oxide powders. This allowed the development of titanium oxide-tungsten oxide films as analyzed using XPS. Examination in the SEM and AFM showed that the films were nano-porous with the pore size and pore orientation varying as a function of the deposition angle. UV-Vis spectra of the films show an increase of transmittance with increasing deposition angle which is attributed to the structure and porosity of the films. Raman analysis indicated that the as-deposited films have broad and weak Raman characteristics, attributed to the nanocrystal nature of the films and the presence of defects, and the peak broadening deceases after annealing the film, as expected.

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25 citations in Scopus
22 citations in Web of Science®
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ID Code: 5451
Item Type: Journal Article
Refereed: Yes
Keywords: Tungsten dioxide, nanoporous materials, nanotechnology, sputtering
DOI: 10.1016/j.apsusc.2006.10.065
ISSN: 0169-4332
Subjects: Australian and New Zealand Standard Research Classification > PHYSICAL SCIENCES (020000) > CONDENSED MATTER PHYSICS (020400) > Surfaces and Structural Properties of Condensed Matter (020406)
Divisions: Past > QUT Faculties & Divisions > Faculty of Built Environment and Engineering
Copyright Owner: Copyright 2006 Elsevier
Copyright Statement: Reproduced in accordance with the copyright policy of the publisher.
Deposited On: 15 Mar 2007 00:00
Last Modified: 02 Jul 2017 13:01

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