Reactive plasmas as a versatile nanofabrication tool
Ostrikov, Ken (2005) Reactive plasmas as a versatile nanofabrication tool. Reviews of Modern Physics, 77(2), pp. 489-511.
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Description
The underlying physics of the application of low-temperature, low-pressure reactive plasmas in various nanoassembly processes is described. From the viewpoint of the "cause and effect" approach, this Colloquium focuses on the benefits and challenges of using plasma-based systems in nanofabrication of nanostructured silicon films, low-dimensional semiconducting quantum structures, ordered carbon nanotip arrays, highly crystalline TiO2 coatings, and nanostructured hydroxyapatite bioceramics. Other examples and future prospects of plasma-aided nanofabrication are also discussed. © 2005 The American Physical Society.
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| ID Code: | 74153 | ||
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| Item Type: | Contribution to Journal (Journal Article) | ||
| Refereed: | Yes | ||
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| Measurements or Duration: | 23 pages | ||
| DOI: | 10.1103/RevModPhys.77.489 | ||
| ISSN: | 0034-6861 | ||
| Pure ID: | 34329590 | ||
| Divisions: | Past > QUT Faculties & Divisions > Science & Engineering Faculty | ||
| Copyright Owner: | Consult author(s) regarding copyright matters | ||
| Copyright Statement: | This work is covered by copyright. Unless the document is being made available under a Creative Commons Licence, you must assume that re-use is limited to personal use and that permission from the copyright owner must be obtained for all other uses. If the document is available under a Creative Commons License (or other specified license) then refer to the Licence for details of permitted re-use. It is a condition of access that users recognise and abide by the legal requirements associated with these rights. If you believe that this work infringes copyright please provide details by email to qut.copyright@qut.edu.au | ||
| Deposited On: | 21 Jul 2014 01:43 | ||
| Last Modified: | 19 Feb 2025 22:57 |
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