Optical and Electrical Properties of Nitrogen Ion Implanted Fluorine Doped Tin Oxide Films

Tesfamichael, Tuquabo, Will, Geoffrey D., Colella, Michael, & Bell, John M. (2003) Optical and Electrical Properties of Nitrogen Ion Implanted Fluorine Doped Tin Oxide Films. Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 201(4), pp. 581-588.

View at publisher


Tin oxide films were implanted with N+ at various energies between 5 to 40 keV for different ion doses between 1014 to 1016 cm-2. The microstructure, optical and electrical properties of the films were investigated. From Transmission Electron Microscopy the implanted films were shown to be amorphous. The implanted thickness for the 10 keV and 40 keV were found to be 30 nm and 110 nm, respectively. The ion penetration depths for these films were calculated using SRIM-2000 and found to be 35 nm (at 10 keV) and 120 nm (at 40 keV). The optical properties of the implanted films were measured and transmittance was found to decrease with increasing implantation energy and/or ion dose. The luminous transmittance of the films decreased from 0.70 for the unimplanted film to about 0.57 for the highest implantation energy and largest ion dose. By annealing the films large part of the defects have been removed and thereby increasing the transmittance of the films. The electrical properties of the films were investigated and found an increase of sheet resistance with increasing implantation energy and/or ion dose. The increase of sheet resistance after ion implantation is caused by a loss of crystallinity of the tin oxide films. After annealing the sheet resistance decreases because the crystallinity was partially recovered.

Impact and interest:

5 citations in Scopus
5 citations in Web of Science®
Search Google Scholar™

Citation counts are sourced monthly from Scopus and Web of Science® citation databases.

These databases contain citations from different subsets of available publications and different time periods and thus the citation count from each is usually different. Some works are not in either database and no count is displayed. Scopus includes citations from articles published in 1996 onwards, and Web of Science® generally from 1980 onwards.

Citations counts from the Google Scholar™ indexing service can be viewed at the linked Google Scholar™ search.

Full-text downloads:

459 since deposited on 16 May 2007
9 in the past twelve months

Full-text downloads displays the total number of times this work’s files (e.g., a PDF) have been downloaded from QUT ePrints as well as the number of downloads in the previous 365 days. The count includes downloads for all files if a work has more than one.

ID Code: 7723
Item Type: Journal Article
Refereed: Yes
Keywords: tin oxide, nitrogen ion implantation, electrical properties, optical properties, TEM analysis
DOI: 10.1016/S0168-583X(02)02226-7
ISSN: 0168-583X
Subjects: Australian and New Zealand Standard Research Classification > ENGINEERING (090000) > MATERIALS ENGINEERING (091200) > Materials Engineering not elsewhere classified (091299)
Divisions: Past > QUT Faculties & Divisions > Faculty of Built Environment and Engineering
Copyright Owner: Copyright 2003 Elsevier
Copyright Statement: Reproduced in accordance with the copyright policy of the publisher.
Deposited On: 16 May 2007 00:00
Last Modified: 29 Feb 2012 13:00

Export: EndNote | Dublin Core | BibTeX

Repository Staff Only: item control page